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Macro and microsurface morphology reconstructions during laser-induced etching of silicon

Journal

MICRON
Volume 39, Issue 3, Pages 287-293

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.micron.2007.04.005

Keywords

laser-induced etching; surface morphology; SENT; AFM

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Surface morphologies of the laser-etched silicon were studied as a function of the laser power densities. Scanning electron microscope (SEM) results show that different kind of microstructures develop. Pores like structures are formed at low laser power density and pillar like structures are obtained at higher laser power density. It is the etching rate, which is responsible for the surface morphology reconstructions. Etching rate was found to be a function of the laser power density. Atomic force microscope (AFM) results reveal that macro and microsurface morphology reconstructions take place simultaneously as a result of increasing etching rate. Macrosurface morphology reconstruction takes place on the silicon wafer surface and the microsurface morphology reconstruction takes place inside the pore wall. (C) 2007 Elsevier Ltd. All rights reserved.

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