4.4 Article Proceedings Paper

Copper pillar interconnect capability for mmwave applications in 3D integration technology

Journal

MICROELECTRONIC ENGINEERING
Volume 107, Issue -, Pages 72-79

Publisher

ELSEVIER
DOI: 10.1016/j.mee.2012.10.024

Keywords

Copper pillar; Mmwave; Interconnections; Si interposer; Underfill; Die aspect ratio

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3D integration technology opens the way of heterogeneous silicon platform, as for example, millimeter-wave functionalities could be integrated in future communication modules. Consequently, copper pillar technology realized at 1st level of interconnection between silicon top dies and silicon interposer must be evaluated in this new frequency range. In this paper, a test vehicle has been designed to assess radio frequency behavior of 3D stacking as insertion losses (IL) up to 40 GHz induce by copper pillar interconnection and assembly parameters (pitch, underfilling,...). Copper pillar ground-signal-ground (GSG) vertical transition exhibits IL lower than 0.2 dB at 40 GHz on high resistive silicon substrate and seems to be the minor contributor of all 3D interconnections as TSV, and RDL. Capillary underfill and GSG transition pitch have been evaluated to have a weak impact. Cu ring designed to limit bleed-out and fillet assures PAD integrity and induces a strong signal reflection above 15 GHz. Finally, process assembly robustness of high aspect ratio top die (10 x 3 mm(2)) has been assessed with DC measurements. (c) 2013 Elsevier B.V. All rights reserved.

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