Electron beam lithography using plasma polymerized hexane as resist

Published 2009 View Full Article

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Title
Electron beam lithography using plasma polymerized hexane as resist
Authors
Keywords
-
Journal
MICROELECTRONIC ENGINEERING
Volume 87, Issue 5-8, Pages 1112-1114
Publisher
Elsevier BV
Online
2009-11-16
DOI
10.1016/j.mee.2009.11.043

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