Stamp deformation and its influence on residual layer homogeneity in thermal nanoimprint lithography

Published 2008 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Stamp deformation and its influence on residual layer homogeneity in thermal nanoimprint lithography
Authors
Keywords
-
Journal
MICROELECTRONIC ENGINEERING
Volume 85, Issue 5-6, Pages 877-880
Publisher
Elsevier BV
Online
2008-01-29
DOI
10.1016/j.mee.2008.01.045

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.