Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology

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Title
Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology
Authors
Keywords
-
Journal
MEDICAL ENGINEERING & PHYSICS
Volume 33, Issue 6, Pages 730-738
Publisher
Elsevier BV
Online
2011-02-23
DOI
10.1016/j.medengphy.2011.01.011

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