Influence of rapid-thermal-annealing temperature on properties of rf-sputtered SnOx thin films

Published 2015 View Full Article

Authors

Keywords

SnO, Infrared rapid thermal annealing, p-type metal oxide semiconductor

Journal

APPLIED SURFACE SCIENCE

Volume 327, Issue -, Pages 358-363

Publisher

Elsevier BV

Online

2014-11-27

DOI

10.1016/j.apsusc.2014.11.115

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