Research on titanium nitride thin films deposited by reactive magnetron sputtering for MEMS applications

Title
Research on titanium nitride thin films deposited by reactive magnetron sputtering for MEMS applications
Authors
Keywords
Titanium nitride thin films, Reactive magnetron sputtering, Adhesion, Mechanical and tribological characterization, MEMS
Journal
APPLIED SURFACE SCIENCE
Volume 358, Issue -, Pages 525-532
Publisher
Elsevier BV
Online
2015-07-16
DOI
10.1016/j.apsusc.2015.07.063

Ask authors/readers for more resources

Reprint

Contact the author

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search