Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering

Published 2011 View Full Article

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Title
Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering
Authors
Keywords
-
Journal
Materials Science and Engineering B-Advanced Functional Solid-State Materials
Volume 176, Issue 11, Pages 850-854
Publisher
Elsevier BV
Online
2011-05-01
DOI
10.1016/j.mseb.2011.04.015

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