Journal
MATERIALS CHEMISTRY AND PHYSICS
Volume 129, Issue 3, Pages 1195-1200Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.matchemphys.2011.06.006
Keywords
Mesoporous silica films; Methyl-functionalization; Ultra low-k materials; Structural stability
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Funding
- Shanghai Pujiang Project [05PG14015]
- Shanghai Education Development Foundation [2007CG72]
- Shanghai Municipal Education Commission [J50102]
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Vapor phase treatment with tetraethyl orthosilicate (TEOS) is used to improve the performance of methylated mesoporous silica films spin-coated on silicon wafers. Subsequent calcination leads to formation of ultra low dielectric-constant (k) films with high hydrophobicity and structural stability. The k value of the films is about 1.75, and remains as low as 1.82 in an 80%-relative-humidity environment over seven days. Mechanical strength (elastic modulus and hardness) is high enough to withstand the stresses that occur during the chemical mechanical polishing and wire bonding process (E = 10.9 GPa). Effects of the methyl group and TEOS vapor treatment on the structural stability and hydrophobicity are systematically studied. (C) 2011 Elsevier B.V. All rights reserved.
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