Highly Efficient Surface Relief Formation via Photoembossing of a Supramolecular Polymer

Title
Highly Efficient Surface Relief Formation via Photoembossing of a Supramolecular Polymer
Authors
Keywords
-
Journal
MACROMOLECULAR CHEMISTRY AND PHYSICS
Volume 209, Issue 20, Pages 2094-2099
Publisher
Wiley
Online
2008-08-08
DOI
10.1002/macp.200800355

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