Highly-conformal p-type copper(I) oxide (Cu2O) thin films by atomic layer deposition using a fluorine-free amino-alkoxide precursor

Published 2015 View Full Article

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Title
Highly-conformal p-type copper(I) oxide (Cu2O) thin films by atomic layer deposition using a fluorine-free amino-alkoxide precursor
Authors
Keywords
Cu, 2, O thin films, Atomic layer deposition, p-Type semiconductor, Conformality
Journal
APPLIED SURFACE SCIENCE
Volume 349, Issue -, Pages 673-682
Publisher
Elsevier BV
Online
2015-05-21
DOI
10.1016/j.apsusc.2015.05.062

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