Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma

Published 2015 View Full Article

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Title
Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
Authors
Keywords
Aluminum nitride, Atomic layer deposition, Trimethylaluminum, Membrane
Journal
APPLIED SURFACE SCIENCE
Volume 338, Issue -, Pages 35-41
Publisher
Elsevier BV
Online
2015-02-25
DOI
10.1016/j.apsusc.2015.02.119

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