Improved etch resistance of ZEP 520A in reactive ion etching through heat and ultraviolet light treatment

Published 2009 View Full Article

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Title
Improved etch resistance of ZEP 520A in reactive ion etching through heat and ultraviolet light treatment
Authors
Keywords
-
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 27, Issue 2, Pages 581
Publisher
American Vacuum Society
Online
2009-04-03
DOI
10.1116/1.3086721

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