Near neighbor averaging: A technique for improving image uniformity in aperture array lithography

Title
Near neighbor averaging: A technique for improving image uniformity in aperture array lithography
Authors
Keywords
-
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 27, Issue 6, Pages 2674
Publisher
American Vacuum Society
Online
2009-12-15
DOI
10.1116/1.3265462

Ask authors/readers for more resources

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started