HfO2 dielectric film growth directly on graphene by H2O-based atomic layer deposition

Published 2013 View Full Article

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Title
HfO2 dielectric film growth directly on graphene by H2O-based atomic layer deposition
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 32, Issue 1, Pages 01A103
Publisher
American Vacuum Society
Online
2013-11-05
DOI
10.1116/1.4828361

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