4.1 Article

An a-Si:H TFT Manufactured on an Ultra-Thin Mo Foil

Journal

JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume 54, Issue 1, Pages 427-431

Publisher

KOREAN PHYSICAL SOC
DOI: 10.3938/jkps.54.427

Keywords

Amorphous silicon; Thin-film transistor; Mo foil; Mechanical stress

Funding

  1. Ministry of Science Technology [2007-02775]

Ask authors/readers for more resources

We have studied the fabrication of hydrogenated amorphous silicon thin-film transistor (a-Si:H TFT) backplanes on flexible molybdenum (Mo) foils. An a-Si:H TFT manufactured on a 21-mu m-thick Mo foil exhibited a field-effect mobility of 0.27 cm(2)/Vs, a threshold voltage of 6.8 V and a sub-threshold slope of 1.2 V/decade. We found that the TFT performance on the foil was stable until a bending with a radius of 10 mm inward or outward.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.1
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available