Optimization of Oxygen Annealing Process to Increase the Work Function of Mo/Ti or Cu/Ti Film by Inserting Partially Oxidized Thin Layer at Surface Region

Title
Optimization of Oxygen Annealing Process to Increase the Work Function of Mo/Ti or Cu/Ti Film by Inserting Partially Oxidized Thin Layer at Surface Region
Authors
Keywords
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Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 159, Issue 6, Pages H575-H581
Publisher
The Electrochemical Society
Online
2012-04-04
DOI
10.1149/2.048206jes

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