Atomic Layer Deposition and Characterization of Aluminum Silicate Thin Films for Optical Applications

Title
Atomic Layer Deposition and Characterization of Aluminum Silicate Thin Films for Optical Applications
Authors
Keywords
-
Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 158, Issue 2, Pages P15
Publisher
The Electrochemical Society
Online
2010-12-04
DOI
10.1149/1.3519497

Ask authors/readers for more resources

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search