Interface Defects in HfO[sub 2], LaSiO[sub x], and Gd[sub 2]O[sub 3] High-k/Metal–Gate Structures on Silicon

Authors

Keywords

Journal

Volume 155, Issue 2, Pages G13

Publisher

The Electrochemical Society

Online

2007-12-27

DOI

10.1149/1.2806172

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