Atomic Layer Deposition of Y[sub 2]O[sub 3] Films on Silicon Using Tris(ethylcyclopentadienyl) Yttrium Precursor and Water Vapor

Authors

Keywords

Journal

Volume 155, Issue 8, Pages G152

Publisher

The Electrochemical Society

Online

2008-07-11

DOI

10.1149/1.2929825

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