Characteristics of SiO[sub 2]-Like Thin Film Deposited by Atmospheric-Pressure PECVD Using HMDS∕O[sub 2]∕Ar

Published 2008 View Full Article

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Title
Characteristics of SiO[sub 2]-Like Thin Film Deposited by Atmospheric-Pressure PECVD Using HMDS∕O[sub 2]∕Ar
Authors
Keywords
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Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 155, Issue 3, Pages D163
Publisher
The Electrochemical Society
Online
2008-03-21
DOI
10.1149/1.2822963

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