Sub-100 nm Nanolithography and Pattern Transfer on Compound Semiconductor Using Sol-Gel-Derived TiO[sub 2] Resist

Published 2008 View Full Article

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Title
Sub-100 nm Nanolithography and Pattern Transfer on Compound Semiconductor Using Sol-Gel-Derived TiO[sub 2] Resist
Authors
Keywords
-
Journal
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 155, Issue 5, Pages P57
Publisher
The Electrochemical Society
Online
2008-04-08
DOI
10.1149/1.2883730

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