Aqueous Solutions for Low-Temperature Photoannealing of Functional Oxide Films: Reaching the 400 °C Si-Technology Integration Barrier

Published 2011 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Aqueous Solutions for Low-Temperature Photoannealing of Functional Oxide Films: Reaching the 400 °C Si-Technology Integration Barrier
Authors
Keywords
-
Journal
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume 133, Issue 33, Pages 12922-12925
Publisher
American Chemical Society (ACS)
Online
2011-08-02
DOI
10.1021/ja203553n

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.