Sub-100 nm Patterning of Supported Bilayers by Nanoshaving Lithography

Published 2008 View Full Article

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Title
Sub-100 nm Patterning of Supported Bilayers by Nanoshaving Lithography
Authors
Keywords
-
Journal
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume 130, Issue 9, Pages 2718-2719
Publisher
American Chemical Society (ACS)
Online
2008-02-08
DOI
10.1021/ja077730s

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