Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS

Title
Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS
Authors
Keywords
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Journal
PLASMA SOURCES SCIENCE & TECHNOLOGY
Volume 24, Issue 3, Pages 035018
Publisher
IOP Publishing
Online
2015-06-01
DOI
10.1088/0963-0252/24/3/035018

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