Journal
JOURNAL OF SUPERHARD MATERIALS
Volume 30, Issue 4, Pages 273-275Publisher
SPRINGER
DOI: 10.3103/S1063457608040072
Keywords
tribochemistry; polishing; sapphire; silica
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The paper presents the findings of a study of the intensity of tribochemical contact interaction between sapphire (alpha-Al2O3) and a polishing compound based on colloidal silica SiO2, which occurs in polishing precision electronic and optical components. It has been established that the main factor that intensifies this interaction is the acceleration of a chemical reaction between Al2O3 and SiO2 with increasing contact temperature, which experimentally validates the chemical nature of the tribochemical polishing process and allows a significant reduction of its labor intensity.
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