Journal
JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY
Volume 64, Issue 2, Pages 297-303Publisher
SPRINGER
DOI: 10.1007/s10971-012-2857-9
Keywords
Photosensitivity; Patterning; Nb2O5; UV-irradiation; Refractive index
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In this study, in order to develop a new photosensitive gel film, Nb2O5 gel films including a chelate ring were prepared by the sol-gel method. Photosensitive and patterning properties of the gel films were investigated. Properties such as refractive index for annealed films were also evaluated. In the electronic absorption spectra of the gel films, the absorption peak assigned a chelate ring was observed at 353 nm, this peak intensity decreased by UV irradiation. From this result, the obtained gel films exhibit photosensitivity. Fine patterns (minimal width of about 2 mu m) could be fabricated. It was found that the value of refractive index reaches a maximum of 2.25 for the film heat-treated at 800 A degrees C.
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