Electrical decoupling effect on intermediate band Ti-implanted silicon layers

Published 2013 View Full Article

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Title
Electrical decoupling effect on intermediate band Ti-implanted silicon layers
Authors
Keywords
-
Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 46, Issue 13, Pages 135108
Publisher
IOP Publishing
Online
2013-03-05
DOI
10.1088/0022-3727/46/13/135108

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