Characterization and global modelling of low-pressure hydrogen-based RF plasmas suitable for surface cleaning processes

Title
Characterization and global modelling of low-pressure hydrogen-based RF plasmas suitable for surface cleaning processes
Authors
Keywords
-
Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 46, Issue 47, Pages 475206
Publisher
IOP Publishing
Online
2013-11-05
DOI
10.1088/0022-3727/46/47/475206

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