Recent progress in thin film processing by magnetron sputtering with plasma diagnostics

Title
Recent progress in thin film processing by magnetron sputtering with plasma diagnostics
Authors
Keywords
-
Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 42, Issue 4, Pages 043001
Publisher
IOP Publishing
Online
2009-01-22
DOI
10.1088/0022-3727/42/4/043001

Ask authors/readers for more resources

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started