Diagnostic and processing in SF6RF remote plasma for silicon etching

Title
Diagnostic and processing in SF6RF remote plasma for silicon etching
Authors
Keywords
-
Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 42, Issue 17, Pages 175206
Publisher
IOP Publishing
Online
2009-08-20
DOI
10.1088/0022-3727/42/17/175206

Ask authors/readers for more resources

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started