Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2 + NO → F + FNO at an Elevated Temperature

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Title
Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2 + NO → F + FNO at an Elevated Temperature
Authors
Keywords
-
Journal
Journal of Physical Chemistry C
Volume 117, Issue 40, Pages 20810-20818
Publisher
American Chemical Society (ACS)
Online
2013-09-07
DOI
10.1021/jp4084794

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