Simulation of Titanium Metal/Titanium Dioxide Etching with Chlorine and Hydrogen Chloride Gases Using the ReaxFF Reactive Force Field

Published 2013 View Full Article

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Title
Simulation of Titanium Metal/Titanium Dioxide Etching with Chlorine and Hydrogen Chloride Gases Using the ReaxFF Reactive Force Field
Authors
Keywords
-
Journal
JOURNAL OF PHYSICAL CHEMISTRY A
Volume 117, Issue 27, Pages 5655-5663
Publisher
American Chemical Society (ACS)
Online
2013-06-10
DOI
10.1021/jp4031943

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