Simulation and Mitigation of Pattern and Process Dependencies in Nanoimprint Lithography

Authors

Keywords

Journal

Volume 24, Issue 1, Pages 47-55

Publisher

Technical Association of Photopolymers, Japan

Online

2011-07-21

DOI

10.2494/photopolymer.24.47

References

View 2 related references

Explore over 38,000 international journals covering a vast array of academic fields.

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now