Extension Options for 193nm Immersion Lithography

Materials for double patterning strategies: Development and application

(2009) D. Perret et al.   MICROELECTRONIC ENGINEERING

Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography

(2008) Naphtali A. O’Connor et al.   CHEMISTRY OF MATERIALS

Using KLUP for Understanding Trends in EUV Resist Performance

(2008) Roel Gronheid et al.   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Double Patterning Materials for Sub-40nm Application

(2008) Yusuke Anno et al.   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

A Novel Resist Freeze Process for Double Imaging

(2008) David J. Abdallah et al.   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Development of Materials and Processes for Double Patterning toward 32nm Node ArF Immersion Lithography

(2008) Shinji Tarutani et al.   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

A new type of eco-friendly resist based on nonchemically amplified system

(2008) Ji Young Park et al.   JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY

Patterned wafer defect density analysis of step and flash imprint lithography

(2008) I. McMackin et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B