4.2 Article

Doping of Carbon Nanotubes Using Low Energy Ion Implantation

Journal

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume 10, Issue 6, Pages 3934-3939

Publisher

AMER SCIENTIFIC PUBLISHERS
DOI: 10.1166/jnn.2010.1989

Keywords

Carbon Nanotubes; Doping; Ion Implantation; Oxygen; Nitrogen

Funding

  1. MOE
  2. MOST [10029846-2007-01]
  3. WCU (World Class University) [R31-2008-000-10029-0]

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Carbon nanotubes (CNTs) were implanted with thermally decomposed oxygen (O-2(+)) and nitrogen (N-2(+)) ions at an acceleration voltage of 20 V. With a low dose of oxygen ions, the CNT-FET exhibited p-type behaviors with substantial changes in threshold voltage and in the slope of the source-drain current (I-sd). However, at high dosages, the device exhibited metallic behaviors. After nitrogen doping, we did not observe the effects of electron doping. Instead, nitrogen doping significantly increased I-sd with no gating effect. Our theoretical results showed that the metallic behavior of nitrogen-doped CNTs arose from the impurity conduction band, which results from the overlapping wave function of the nitrogen impurity.

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