Role of Trimethylboron to Silane Ratio on the Properties of p-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition

Published 2010 View Full Article

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Title
Role of Trimethylboron to Silane Ratio on the Properties of p-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition
Authors
Keywords
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Journal
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume 10, Issue 4, Pages 2547-2551
Publisher
American Scientific Publishers
Online
2010-04-02
DOI
10.1166/jnn.2010.1434

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