Lithography-free glass surface modification by self-masking during dry etching

Published 2011 View Full Article

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Title
Lithography-free glass surface modification by self-masking during dry etching
Authors
Keywords
-
Journal
Journal of Nanophotonics
Volume 5, Issue 1, Pages 051703
Publisher
SPIE-Intl Soc Optical Eng
Online
2011-05-06
DOI
10.1117/1.3586787
References
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