Analysis of weakly bonded oxygen in HfO2/SiO2/Si stacks by using HRBS and ARXPS

Published 2009 View Full Article

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Title
Analysis of weakly bonded oxygen in HfO2/SiO2/Si stacks by using HRBS and ARXPS
Authors
Keywords
-
Journal
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 21, Issue 5, Pages 475-480
Publisher
Springer Nature
Online
2009-07-14
DOI
10.1007/s10854-009-9941-0

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