Theoretical Simulation of Surface Evolution Using the Random Deposition and Surface Relaxation for Metal Oxide Film in Atomic Layer Deposition

Published 2010 View Full Article

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Title
Theoretical Simulation of Surface Evolution Using the Random Deposition and Surface Relaxation for Metal Oxide Film in Atomic Layer Deposition
Authors
Keywords
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Journal
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
Volume 26, Issue 4, Pages 371-374
Publisher
Elsevier BV
Online
2010-08-03
DOI
10.1016/s1005-0302(10)60061-8

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