Hydrogen depth profile in phosphorus-doped, oxygen-free copper after cathodic charging

Title
Hydrogen depth profile in phosphorus-doped, oxygen-free copper after cathodic charging
Authors
Keywords
-
Journal
JOURNAL OF MATERIALS SCIENCE
Volume 47, Issue 19, Pages 6768-6776
Publisher
Springer Nature
Online
2012-06-29
DOI
10.1007/s10853-012-6592-y

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