Photo-removal of sulfamethoxazole (SMX) by photolytic and photocatalytic processes in a batch reactor under UV-C radiation (λmax=254nm)

Title
Photo-removal of sulfamethoxazole (SMX) by photolytic and photocatalytic processes in a batch reactor under UV-C radiation (λmax=254nm)
Authors
Keywords
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Journal
JOURNAL OF HAZARDOUS MATERIALS
Volume 186, Issue 1, Pages 67-75
Publisher
Elsevier BV
Online
2010-10-28
DOI
10.1016/j.jhazmat.2010.10.080

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