Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography

Published 2015 View Full Article

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Title
Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography
Authors
Keywords
-
Journal
OPTICS EXPRESS
Volume 23, Issue 13, Pages 16628
Publisher
The Optical Society
Online
2015-06-17
DOI
10.1364/oe.23.016628

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