Defect Reduction in AlN Epilayers Grown by MOCVD via Intermediate-Temperature Interlayers

Title
Defect Reduction in AlN Epilayers Grown by MOCVD via Intermediate-Temperature Interlayers
Authors
Keywords
AlN, intermediate-temperature interlayers, threading dislocation density, MOCVD
Journal
JOURNAL OF ELECTRONIC MATERIALS
Volume 44, Issue 1, Pages 217-221
Publisher
Springer Nature
Online
2014-11-14
DOI
10.1007/s11664-014-3462-1

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