Low-Dimensional Waveguide Grating Fabrication in GaN with Use of SiCl4/Cl2/Ar-Based Inductively Coupled Plasma Dry Etching

Published 2009 View Full Article

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Title
Low-Dimensional Waveguide Grating Fabrication in GaN with Use of SiCl4/Cl2/Ar-Based Inductively Coupled Plasma Dry Etching
Authors
Keywords
-
Journal
JOURNAL OF ELECTRONIC MATERIALS
Volume 38, Issue 5, Pages 635-639
Publisher
Springer Nature
Online
2009-03-04
DOI
10.1007/s11664-009-0731-5

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