Journal
JOURNAL OF ELECTRONIC MATERIALS
Volume 38, Issue 6, Pages 718-724Publisher
SPRINGER
DOI: 10.1007/s11664-008-0584-3
Keywords
Graphene; silicon carbide; semiconductor; field-effect transistor
Ask authors/readers for more resources
The formation of epitaxial graphene on SiC(0001) surfaces is studied using atomic force microscopy, Auger electron spectroscopy, electron diffraction, Raman spectroscopy, and electrical measurements. Starting from hydrogen-annealed surfaces, graphene formation by vacuum annealing is observed to begin at about 1150A degrees C, with the overall step-terrace arrangement of the surface being preserved but with significant roughness (pit formation) on the terraces. At higher temperatures near 1250A degrees C, the step morphology changes, with the terraces becoming more compact. At 1350A degrees C and above, the surface morphology changes into relatively large flat terraces separated by step bunches. Features believed to arise from grain boundaries in the graphene are resolved on the terraces, as are fainter features attributed to atoms at the buried graphene/SiC interface.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available