4.5 Article

Electrical characteristics of n-ZnO/p-Si heterojunction diodes grown by pulsed laser deposition at different oxygen pressures

Journal

JOURNAL OF ELECTRONIC MATERIALS
Volume 37, Issue 5, Pages 770-775

Publisher

SPRINGER
DOI: 10.1007/s11664-007-0365-4

Keywords

heterojunctions; ZnO; p-Si; pulsed laser deposition

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Heterojunction diodes of n-type ZnO/p-type silicon (100) were fabricated by pulsed laser deposition of ZnO films on p-Si substrates in oxygen ambient at different pressures. These heterojunctions were found to be rectifying with a maximum forward-to-reverse current ratio of about 1,000 in the applied voltage range of -5 V to +5 V. The turn-on voltage of the heterojunctions was found to depend on the ambient oxygen pressure during the growth of the ZnO film. The current density-voltage characteristics and the variation of the series resistance of the n-ZnO/p-Si heterojunctions were found to be in line with the Anderson model and Burstein-Moss (BM) shift.

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