4.7 Article

Evolution of magnetic and structural properties from Ag nanolayers to several microns Co-Ag deposits prepared by electrodeposition

Journal

JOURNAL OF ELECTROANALYTICAL CHEMISTRY
Volume 635, Issue 2, Pages 63-68

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.jelechem.2009.08.003

Keywords

Electroplating; Coercivity; Cobalt-silver thin films; Field-emission scanning electron microscopy (FE-SEM); Selected area electron diffraction-transmission electron microscopy (SAED-TEM)

Funding

  1. Comision Interministerial de Ciencia y Tecnologia (CICYT) [MAT-2006-12913-C02-01]
  2. Departament d'Innovacio
  3. Universitats i Empresa of the Generalitat de Catalunya
  4. Fons Social Europeu

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The evolution of composition, morphology, magnetic properties and crystalline structure of Co-Ag electrodeposits from nanometric to micrometric thicknesses has been analyzed. Different substrates (Si/Ti/Ni, Si/Cr/Cu and glass/ITO) have been used to electrodeposit the Co-Ag system. The same trend was observed in all cases: after a first nanometric silver layer, cobalt was gradually incorporated till constant composition was attained. Moreover, a gradual variation of the magnetic response of the films from diamagnetism to superparamagnetism and then ferromagnetism was detected by increasing the deposition charge. fcc-Ag, hcp-Co and a metastable phase hcp-CoAg3 were present in Co-Ag micrometric deposits grown over Si/Ti/Ni from the very early deposition stages, these deposits showing coercivity values around 115 Oe. However, deposits of lower coercivities (around 50 Oe) were obtained over glass/ITO and Sill Cr/Cu substrates, these deposits being constituted by fcc-Ag and hcp-Co. (C) 2009 Elsevier B.V. All rights reserved.

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