Journal
JOURNAL OF CRYSTAL GROWTH
Volume 403, Issue -, Pages 48-54Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2014.06.012
Keywords
HVPE; GaN; Non-polar GaN; Semi-polar GaN; Homoepitaxy
Funding
- European Union [POIG.01.01.02-00-008/08, POIG.01.04.00-14-153/11]
- European Union within European Regional Development Fund through Polish National Science Centre Grant POLARPOL [PBS1/B5/8/2012]
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In this work homoepitaxial HVPE-GaN growth on non-polar and semi-polar GaN seeds was described. Two crystallization processes, in the same experimental conditions but using different carrier gases: N-2 and H-2, were performed. An influence of growth directions and growth conditions on the growth rate and properties (morphology, structural quality and oxygen and silicon contaminations) of obtained crystals were investigated and discussed. It was shown that the growth rate strongly depends on the growth direction and the carrier gas. It was demonstrated that for the semi-polar [20-21] direction it was possible to obtain high quality and highly conductive (without intentional doping) gallium nitride layers. 2014 Elsevier B.V. All rights reserved.
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