4.4 Article

Growth of corundum-structured In2O3 thin films on sapphire substrates with Fe2O3 buffer layers

Journal

JOURNAL OF CRYSTAL GROWTH
Volume 364, Issue -, Pages 30-33

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2012.11.065

Keywords

Crystal structure; Chemical vapor deposition processes; Oxides; Semiconducting indium compounds

Funding

  1. Japan Society for the Promotion of Science
  2. Ministry of Education, Culture, Sports, Science and Technology of Japan

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We report the fabrication of rhombohedral corundum-structured indium oxide (alpha-In2O3) thin films, which can complete a semiconductor quaternary alloy system with alpha-Al2O3 and alpha-Ga2O3, on sapphire substrates with alpha-Fe2O3 buffer layers. X-ray diffraction showed the formation of alpha-In2O3, and the alpha-In2O3 film exhibited n-type semiconductor properties with electron concentration of 1.2 x 10(18) cm(-3) and electron mobility of 83 cm(2)/Vs. The alpha-In2O3 took grain structure with the lateral sizes of 300-600 nm, and in a grain area alpha-In2O3 grew epitaxially on a sapphire substrate. (C) 2012 Elsevier B.V. All rights reserved.

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